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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Metrology, Inspection, and Process Control for Microlithography XXX - Improving scanner wafer alignment performance by target optimization

Sanchez, Martha I., Ukraintsev, Vladimir A., Leray, Philippe, Jehoul, Christiane, Socha, Robert, Menchtchikov, Boris, Raghunathan, Sudhar, Kent, Eric, Schoonewelle, Hielke, Tinnemans, Patrick, Tuffy,

Year:

2016

Language:

english

File:

PDF, 871 KB

english, 2016

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Performance of the ASML EUV Alpha Demo Tool

Hermans, Jan V., Hendrickx, Eric, Laidler, David, Jehoul, Christiane, Van Den Heuvel, Dieter, Goethals, Anne-Marie, La Fontaine, Bruno M.

Year:

2010

Language:

english

File:

PDF, 3.65 MB

english, 2010

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Optical Microlithography XXX - Computational scanner wafer mark alignment

Erdmann, Andreas, Kye, Jongwook, Menchtchikov, Boris, Socha, Robert, Raghunathan, Sudharshanan, Lyulina, Irina, Schoonewelle, Hielke, Tinnemans, Patrick, Tuffy, Paul, Leray, Philippe, Jehoul, Christia

Year:

2017

Language:

english

File:

PDF, 919 KB

english, 2017

4

Dependence of the minimal PVD TA(N) sealing thickness on the porosity of Zirkon™ LK dielectric films

F Iacopi, C Zistl, C Jehoul, Zs Tokei, Q.T Le, A Das, C Sullivan, G Prokopowicz, D Gronbeck, M Gallagher, J Calvert, K Maex

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 718 KB

english, 2002

5

Single damascene integration of porous Zirkon™ version 1 low-k dielectric films

S. Malhouitre, C. Jehoul, J. Van Aelst, H. Struyf, S. Brongersma, L. Carbonell, I. Vos, G. Beyer, M. Van Hove, D. Gronbeck, M. Gallagher, J. Calvert, K. Maex

Journal:

Microelectronic Engineering

Year:

2003

Language:

english

File:

PDF, 287 KB

english, 2003

6

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Effect of scattering bar assist features in 193-nm lithography

Joesten, Lori A., Reilly, Michael T., DeSisto, Jason, Jehoul, Christiane, Yen, Anthony

Year:

2002

Language:

english

File:

PDF, 233 KB

english, 2002

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - Characterization of EUV resists for defectivity at 32nm

Raymond, Christopher J., Montal, Ofir, Dolev, Ido, Rosenzweig, Moshe, Dotan, Kfir, Meshulach, Doron, Adan, Ofer, Levi, Shimon, Cai, Man-Ping, Bencher, Chris, Ngai, Chris S., Jehoul, Christiane, Van De

Year:

2011

Language:

english

File:

PDF, 2.12 MB

english, 2011

8

The shrug as marker of obviousness

Jehoul, Annelies, Brône, Geert, Feyaerts, Kurt

Journal:

Linguistics Vanguard

Language:

english

File:

PDF, 1.96 MB

english

9

Audio frequency plasma generation reactor configurations for dry etch processing

Guy J.J. Brasseur, Pierre Bruneel, Christiane Jehoul, Johan Vandersmissen

Journal:

Microelectronic Engineering

Year:

1991

Language:

english

File:

PDF, 220 KB

english, 1991

10

High rate single substrate polymer etching for multi- chip-modules (MCM) and off-chip-interconnect applications

E. Beynen, J. Roggen, R. Vanhoof, G.J.J. Brasseur, C. Jehoul

Journal:

Microelectronic Engineering

Year:

1992

Language:

english

File:

PDF, 305 KB

english, 1992

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Hybrid overlay metrology with CDSEM in a BEOL patterning scheme

Cain, Jason P., Sanchez, Martha I., Leray, Philippe, Jehoul, Christiane, Inoue, Osamu, Okagawa, Yutaka

Year:

2015

Language:

english

File:

PDF, 1.43 MB

english, 2015

12

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Process latitude comparison of advanced DUV photoresists to latest-generation 193-nm photoresists

Joesten, Lori A., Reilly, Michael T., Linskens, Frank T., Jehoul, Christiane, Parker, Colin R., Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 379 KB

english, 2001

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Micro-bridge defects: characterization and root cause analysis

Santoro, Gaetano, Raymond, Christopher J., Van den Heuvel, Dieter, Braggin, Jennifer, Rosslee, Craig, Leray, Philippe J., Cheng, Shaunee, Jehoul, Christiane, Schreutelkamp, Robert, Hillel, Noam

Year:

2010

Language:

english

File:

PDF, 6.01 MB

english, 2010

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - EUV processing investigation on state of the art coater/developer system

Shite, H., La Fontaine, Bruno M., Naulleau, Patrick P., Bradon, N., Shimoaoki, T., Kobayashi, S., Nafus, K., Kosugi, H., Foubert, P., Hermans, J., Hendrickx, E., Goethals, M., Gronheid, R., Jehoul, C.

Year:

2011

Language:

english

File:

PDF, 2.26 MB

english, 2011

15

SPIE Proceedings [SPIE Photomask Japan 2014 - Yokohama, Japan (Tuesday 15 April 2014)] Photomask and Next-Generation Lithography Mask Technology XXI - Towards reduced impact of EUV mask defectivity on wafer

Kato, Kokoro, Jonckheere, R., Van den Heuvel, D., Pacco, A., Pollentier, I., Baudemprez, B., Jehoul, C., Hermans, J., Hendrickx, E.

Year:

2014

Language:

english

File:

PDF, 6.87 MB

english, 2014

16

Nucleation and growth kinetics of electrodeposited Ni films on Si(100) surfaces

Philipsen, Harold, Jehoul, Hannes, Inoue, Fumihiro, Vandersmissen, Kevin, Yang, Liu, Struyf, Herbert, van Dorp, Dennis

Journal:

Electrochimica Acta

Year:

2017

Language:

english

File:

PDF, 1.65 MB

english, 2017

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Optical Microlithography XXX - Reducing the impact of etch-induced pattern shift on overlay by using lithography and etch tool corrections

Erdmann, Andreas, Kye, Jongwook, Kubis, Michael, Wise, Rich, Chahine, Charlotte, Viatkina, Katja, Ur-Rehman, Samee, Simons, Geert, Dusa, Mircea, Hellin, David, Sobieski, Daniel, Zhang, Wenzhe, Jehoul,

Year:

2017

Language:

english

File:

PDF, 1.09 MB

english, 2017

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - SEM-based overlay measurement between via patterns and buried M1 patterns using high-voltage SEM

Sanchez, Martha I., Ukraintsev, Vladimir A., Hasumi, Kazuhisa, Inoue, Osamu, Okagawa, Yutaka, Shao, Chuanyu, Leray, Philippe, Halder, Sandip, Lorusso, Gian, Jehoul, Christiane

Year:

2017

Language:

english

File:

PDF, 1009 KB

english, 2017

19

188Relation between terminal QRS axis and response to cardiac resynchronization therapy

Koopman, P., Jehoul, P., Keskin, M., Van Beveren, J., Van Eyken, J., Schurmans, J., Dilling-Boer, D., Vijgen, J., Volders, PG., Gorgels, AP.

Journal:

Year:

2017

Language:

english

File:

PDF, 211 KB

english, 2017

20

Multimodale uitdrukkingen van vanzelfsprekendheid

Jehoul, Annelies, Feyaerts, Kurt

Journal:

Nederlandse taalkunde

Year:

2017

File:

PDF, 488 KB

2017